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Master fabrication for optical-data disks using reactive ion-beam etching (1985)

Graf, H. P. ; Bösch, M. A. ; Good, E. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 58 (1985), S. 3255-3257

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: A new mastering process for optical-data disks is described. The master disk consists of a glass substrate covered with an indium-oxide film. Reactive ion-beam etching with CCl4 is used to selectively etch the information pits into the indium-oxide layer. Pits with tapered walls are obtained by controlled erosion of the etch mask. This technique allows a better control of the pit shape than the conventional mastering process. Moreover, several metal copies can be made from the same master while conventional masters are destroyed after the first copy is made.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.335783

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