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Composition and chemical reactions of titanium oxide films deposited by laser evaporation (1991)

Dai, C. M. ; Su, C. S. ; Chuu, D. S.

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 69 (1991), S. 3766-3768

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Details

ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: Thin films were deposited on Pyrex glass substrates from Ti and TiO2 targets at room temperature by laser evaporation technique. These films were characterized by scanning electron microscopy, Auger electron spectroscopy, and depth profile analysis. The films deposited from Ti target are TiCx and TiOy matrix, while films from TiO2 target are almost stoichiometric in oxygen. The films have a smooth surface morphology under a laser power density of 5 × 106 W/cm2, which is close to the critical intensity for evaporation. The interface reaction of these films is strong, and the Ti atoms diffuse into the substrate.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.348473

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