ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Morphologies of Si surfaces treated with aqueous solutions of hydrofluoric acid (HF) and ammonium fluoride (NH4F) have been investigated using surface infrared spectroscopy. We confirm that HF-treated Si(111) surfaces are terminated with a monohydride (Si—H), dihydride (Si—H2), and trihydride (Si–H3), whereas NH4F-treated Si(111) surfaces are dominantly terminated with Si—H. For Si(100), treatment in NH4F produces a surface for which the dihydride mode is enhanced compared to HF treatment, suggesting that surface Si—Si bonds on Si(100) are readily cleaved in a NH4F solution to generate a dihydride Si. The effect of varying the HF concentration on the morphology of HF-treated Si(100) surfaces is investigated. It is demonstrated that 5% HF treatment produces Si(100) surfaces which have a larger density of surface Si—Si bonds than 50% HF or 0.5% HF treatment.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.350497
