ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Heavily silicon-doped GaAs grown by molecular beam epitaxy has been studied by combined coupled plasmon-phonon mode Raman spectroscopy and Hall effect measurements. Free electron concentrations up to 2×1019 cm−3 have been achieved with the dopant atoms being incorporated dominantly on Ga sites (≥90%) as measured by local vibrational mode Raman spectroscopy. To extract quantitative information from the plasmon-phonon Raman spectra, these spectra have been fitted using the temperature-dependent Lindhard–Mermin dielectric function including the nonparabolicity of the conduction band and wave vector nonconservation due to the absorption of the incident and scattered light. The excellent agreement found between Hall effect and Raman measurements demonstrates that consistent data on dopant incorporation and activation can be obtained, if band structure effects are accounted for appropriately in the analysis of the Raman spectra.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.353771
