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    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 825-831 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In this paper a model of charged particle behavior in a low-pressure oxygen plasma is developed, and compared with experimental results. Agreement is excellent. It is demonstrated that the extremely high temperature ((approximately-greater-than)1 eV) of electrons in these plasmas results in diffusion totally dominating the transport of charged species. It is also shown that charged particle recombination on the walls of a quartz reactor is insignificant. Finally, the influence of the electron temperature profile must be fully considered for accurate results. This work complements an earlier model of radical behavior in these plasmas. Both are needed to fully understand materials modification in these plasmas, which has been shown to involve a synergism between radicals and charged species.
    Type of Medium: Electronic Resource
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