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Crystallinity and I-V characteristics of Ag thin films deposited on fractal substrates (1994)

Xu, Yu-Qing ; Wang, Jing-Song ; Ye, Gao-Xiang ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 76 (1994), S. 2748-2751

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: The crystallinity, surface morphology, and I-V characteristics of the Ag thin films deposited on fractal substrates by rf magnetron sputtering have been investigated. The poor crystallinity, fractal surface morphology, and abnormal nonlinear I-V behavior of the thin films have been observed. The crystallinity of the films deposited on the fractal substrates is improved by increasing the substrate temperature and the thickness of the thin films. The nonlinear I-V characteristics are influenced by the thickness of the thin films, substrate temperature, and measuring environment.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.357579

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