Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
86 (1999), S. 2459-2463
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have studied the effect of annealing on sputter-deposited Y/Mo multilayer films with a wide range of bilayer periods, looking for evidence of solid-state amorphization. The as-deposited samples are layered, with the individual Y and Mo layers showing little or no crystallographic texture. Upon annealing at 350 °C, the Y and Mo x-ray diffraction peaks become sharper, suggesting slight grain growth, and not the consumption of Y and/or Mo by a solid-state reaction. The layered structure persists, with no change in the intensity of the low-angle superlattice lines that would suggest interdiffusion (which is a prerequisite for solid-state amorphization). Finally, analysis of the stress state of the Y and Mo layers shows essentially no change in unstrained lattice parameter, confirming that no interdiffusion occurs. We conclude that, despite recently published claims to the contrary, solid-state amorphization does not occur in the Y-Mo system. Our results are in accord with the conventional understanding that solid-state amorphization does not occur in systems with positive enthalpies of mixing. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.371076
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