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Mass spectroscopic investigation of the CH3 radicals in a methane rf discharge (1989)

Toyoda, H. ; Kojima, H. ; Sugai, H.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 54 (1989), S. 1507-1509

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Neutral CH3 radicals in a capacitively coupled rf discharge in methane have been detected with a quadrupole mass spectrometer utilizing a threshold ionization technique. The absolute density of CH3 radicals was measured at pressures from 0.5 to 20 mTorr, together with the ionic composition of the methane plasma. The principal ionic species were CH+5 and C2H+5 , except in the low-pressure region, suggesting the importance of ion-molecule reactions in the plasma. The lifetime of CH3 radicals in the afterglow of pulsed rf discharges was measured and explained in terms of the recombination reaction CH3 +CH3 →C2 H6.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.101336

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