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Spatial distribution of CH3 and CH2 radicals in a methane rf discharge (1990)

Sugai, H. ; Kojima, H. ; Ishida, A. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 56 (1990), S. 2616-2618

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Details

ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Spatial distributions of neutral radicals CH3 and CH2 in a capacitively coupled rf glow discharge of methane were measured by threshold ionization mass spectrometry. A strong asymmetry of the density profile was found for the CH2 radical in the high-pressure (∼100 mTorr) discharge. In addition, comprehensive measurements of electron energy distribution, ionic composition, and radical sticking coefficient were made to use as inputs to theoretical modeling of radicals in the methane plasma. The model predictions agree substantially with the measured radical distributions.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.103264

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