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Detection of current-induced vacancies in thin aluminum–copper lines using positrons (1996)

Asoka-Kumar, P. ; O'Brien, K. ; Lynn, K. G. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 68 (1996), S. 406-408

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: In situ depth-resolved positron annihilation spectroscopy (PAS) is used to show dynamic formation of vacancies in 1 μm×1 μm Al-0.5 wt % Cu lines under current flow. We show that the number of vacancies in these lines increases when a dc current (8×104 A/cm2) is applied. This increase in vacancy concentration is substantially greater than that due to thermal vacancy generation alone (4×1018 cm−3 versus 3×1017 cm−3). Isothermal measurements (with no current flow) yield a vacancy formation energy of 0.60±0.02 eV. These results show that PAS can be used to examine the initial stages of interconnect damage due to electromigration. © 1996 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.116700

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