ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have developed a processing technique which is conducted entirely under an ultrahigh vacuum environment, called in situ electron-beam (EB) lithography, to pattern GaAs substrates on which AlGaAs/GaAs wire and box structures are subsequently regrown. In this technique a thin GaAs oxide layer is selectively formed by EB-stimulated oxidation under a controlled oxygen atmosphere, and is then used as a mask material to define mesa stripes and mesa squares by Cl2 gas etching. Subsequently, the initial mesa size is reduced by the regrowth of a GaAs layer. Finally, AlGaAs/GaAs wire and box structures are fabricated on the top of the mesas by the growth of a quantum well. These structures were characterized by cathodoluminescence measurements at 77 K. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.116500
