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Fabrication and properties of all-refractory Nb/Al–AlOx–Ti junctions for microbolometers and microrefrigerators (1998)

Zhao, S. P. ; Du, H. ; Chen, G. H. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 72 (1998), S. 3062-3064

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Fabrication of all-refractory Nb/Al–AlOx–Ti superconducting tunnel junctions using selective titanium etching process (STEP) is described. Results including anodization properties of Ti, and junction's I–V characteristics and subgap currents measured in the temperature range of 0.4–9.2 K are presented. The junctions show fairly high quality with respect to their stability and reproducibility. Possible utilization of these junctions as superconductor–insulator–normal metal type devices operating around 100 mK and above for ultrasensitive microbolometer and electronic microrefrigerator applications is discussed. © 1998 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.121541

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