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Near-infrared Yablonovite-like photonic crystals by focused-ion-beam etching of macroporous silicon (2000)

Chelnokov, A.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 77 (2000), S. 2943-2945

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: We report on the fabrication of three-dimensional (3D) Yablonovite-like photonic crystals by focused-ion-beam (FIB) etching of macroporous silicon. Crystals containing up to 25×25×5 lattice cells are fabricated with a submicronic period of ∼0.75 μm. Photonic band gaps at wavelengths close to 3 μm are demonstrated from reflection measurements and confirmed by numerical calculations. The combination of plasma or chemical etching with FIB micromachining appears to be promising for the fabrication of a large variety of multiple-period 3D photonic crystals at optical wavelengths. © 2000 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1322630

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