ALBERT — All Library Books, journals and Electronic Records Telegrafenberg

Hits per page

hit 1 - 1 | 1 hit

Select All Export

Electronic Resource

High precision, low cost mask for deep x-ray lithography (1998)

Shew, B.-Y. ; Cheng, Y. ; Shih, W.-P. ; [et al.]

Springer

Microsystem technologies 4 (1998), S. 66-69

add to mindlist on the mindlist

Details

ISSN: 1432-1858

Source: Springer Online Journal Archives 1860-2000

Topics: Electrical Engineering, Measurement and Control Technology , Technology

Notes: Abstract The precision of transferred patterns are highly dependent on the quality of the mask in deep x-ray lithography. Many parameters, such as the critical energy of the synchrotron light, beamline optics and even the microstructure to be exposed should be considered in mask design. In this paper, the design rules and the boundary conditions for deep x-ray mask are discussed in general. The method of making a precision, multilayer mask using UV lithography technique is also described.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/s005420050097

	Location	Call Number	Expected	Availability

Others were also interested in ...

Paper (German National Licenses)

Fulltext

hit 1 - 1 | 1 hit