ISSN:
1432-0649
Keywords:
07.65
;
33.00
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract By use of Laser-Induced Fluorescence (LIF) the absolute concentration of the C2 radical in a microwave excited diamond chemical vapour deposition plasma has been measured for the first time. LIF spectra of thed 3 Π g–a 3 Π u (1,0) Swan band near 473 nm were recorded and synthesized theoretically allowing the plasma temperature of 2100 ± 200 K to be inferred. Quenching rates were determined from time-resolved measurements of the fluorescence decay. By calibrating the LIF detection system, using spontaneous Raman scattering in H2 in the reactor vessel, the absolute concentration of C2 was determined to be (7.5 ± 1.7) × 1010 cm−3. Observations of the C2 density under varying plasma conditions are reported.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01091217
