ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
The surface stoichiometry of SiOxNy thin films has been studied by means of x-ray photoelectron spectroscopy (XPS). The modified Auger parameter, applied on the Si 2p core level and Si KL2,3L2,3 Auger signal, has been used to calculate the surface composition of SiOxNy thin films prepared using different methods. The results have been compared with those obtained calculating the area under the XPS peaks and the Rutherford backscattering spectroscopy. The good agreement between these data indicates the validity of the modified Auger parameter as an easy and fast method, available in all electron spectroscopy laboratory, to study the surface stoichiometry of Si-based compounds.
Additional Material:
3 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/sia.740220142
