ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
A method is described to modify profiles of resist patterns in novolac and diazo-oxide containing systems. After patterning of the resist, two successive uniform flood exposures are given, one with deep UV (254 nm) at water-free conditions and the next with near UV (λ 〉 300 nm) at normal atmospheric conditions. The profile which results after development is vertical, concave or overhanging depending on flood exposure conditions and development processing. As the method includes a flood near UV exposure at atmospheric conditions the imagewise exposure energy can be reduced to approximately 35 percent of the normal value. Furthermore it gives also the possibility of using the resist as a deep UV resist. Another important implication is that standing wave effects are completely eliminated.
Additional Material:
9 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760231702
