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Ultraviolet depolymerization of photoresist polymers (1972)

Bolon, D. A. ; Kunz, C. O.

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 12 (1972), S. 109-111

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ISSN: 0032-3888

Keywords: Chemistry ; Chemical Engineering

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: A new method for removal of thin films of photoresist polymers has been found. When polymeric films are exposed to ultraviolet light in the presence of air, the material can be removed leaving an extremely clean surface, free of carbonaceous material. This process has been examined for a variety of photoresist polymers as well as on nonphotoresist polymers and on a variety of substrates. The process offers a new method of photoresist removal.

Additional Material: 4 Ill.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1002/pen.760120206

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