ISSN:
1057-9257
Keywords:
X-ray resists
;
Electron beam
;
Acrylate and methacrylate polymers
;
Polysulphones
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Physics
Notes:
The optimisation of the lithographic performance of negative-working electron beam resists is developed through consideration of the radiation chemistry of crosslinking of representative materials, typically epoxy-functionalised polymers and polystyrene and its derivatives. Similarly, the lithographic behaviour of positive-working systems based on radiation-induced chain scission reactions is discussed with reference to acrylate and methacrylate polymers and polysulphones. The difficulties encountered in devising desirable working systems based on novolacs are considered and contrasted with the promise offered by recent developments arising from the extension of chemical amplification techniques to the electron beam lithographic domain.
Additional Material:
15 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/amo.860040208
