Publication Date:
2020-07-20
Description:
The growth of Fucus vesiculosus L, germlings in chemically defined culture media containing a range of Cu concentrations (20-1000 nM) was monitored simultaneously with measurement of the Cu speciation in the media by competitive equilibrium-adsorptive cathodic stripping voltammetry, Fucus vesiculosus germlings were found to exude Cu-complexing Ligands with conditional stability constants of the order of 1.6 x 10(11), Ligand concentrations increased with increasing total dissolved Cu concentrations (Cu-T) until a concentration of 500-800 neq Cu.L-1 was reached. Concentrations of the ligand exceeded Cu-T in treatments containing 20 and 100 nM Cu-T were similar to Cu-T in the 500-nM Cu treatment, but were less than Cu-T in the 1000-nM treatment. Therefore, [Cu2+] were calculated to be at concentrations of 10(-11) - 10(-10) M in the 20- and 100-nM treatments, 10(-9) M in the 500-nM treatment, and 10(-7) M in the 1000-nM treatment, Growth rates were lowest at Cu2+ concentration 〉 10(-9). These results are discussed within the context of the potential roles for exuded copper-complexing ligands
Type:
Article
,
PeerReviewed
Format:
text
