ISSN:
0032-3888
Schlagwort(e):
Chemistry
;
Chemical Engineering
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Chemie und Pharmazie
,
Maschinenbau
,
Physik
Notizen:
Polymer complex of poly (4-vinylpyrldine) and malonic acid was investigated as a new type of electron beam (EB) resist for dry development, as malonic acid was decomposed by EB irradiation. It was found that the polymer complex could be developed with O2 plasma etching and that the positive resist patterns with high resolution could be obtained. The mechanism for this lithography process was studied by means of IR and ESCA spectra.
Zusätzliches Material:
8 Ill.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1002/pen.760281406