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  • Articles  (7)
  • experimental  (4)
  • rate coefficients  (3)
  • Springer  (7)
  • American Geophysical Union (AGU)
  • Annual Reviews
  • The Royal Society
  • Wiley
  • 1980-1984  (7)
  • 1935-1939
  • Technology  (7)
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  • Articles  (7)
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  • Springer  (7)
  • American Geophysical Union (AGU)
  • Annual Reviews
  • The Royal Society
  • Wiley
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  • 1
    Electronic Resource
    Electronic Resource
    Drift tube investigations on the reactions of O 2 + with CH4 and of CO 2 + with NO in various buffer gases (1981)
    Springer
    Plasma chemistry and plasma processing 1 (1981), S. 65-71 
    Details
    ISSN: 1572-8986
    Keywords: Drift tube ; rate coefficients ; internal excitation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The influence of internal excitation on the reactions of O 2 + + CH4 and of CO 2 + + NO has been investigated using a slow flow drift tube. The rate coefficients for these reactions obtained as a function of relative kinetic energy in various buffer gases like He, Ne, Ar, and Kr showed higher values under conditions where the internal excitation of the reactant ions was enhanced. For both reactions the lowest reactivity at all kinetic energies was observed to occur in He, indicating that He is the least effective buffer for collisionally inducing internal excitation of molecular ions.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00566376
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  • 2
    Electronic Resource
    Electronic Resource
    Plasma polymerization of ethane. I. Experimental studies of effluent gas composition and polymer deposition rates (1983)
    Springer
    Plasma chemistry and plasma processing 3 (1983), S. 139-161 
    Details
    ISSN: 1572-8986
    Keywords: RF plasma ; plasma polymerization ; gas chromatrography ; experimental
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The plasma polymerization of ethane was studied in a flow reactor of rectangular cross section. The plasma was sustained between parallel-plate electrodes by an RF generator operating at 13.56 MHz. The composition of the gas leaving the reactor was analyzed by gas chromatography. Polymer deposition rates were measured as a function of axial position in the reactor, using a quartz-crystal microbalance. The effluent gas is composed primarily of unreacted C2H6 and H2. Significant concentrations of CH4, C2H4, C2H2, and C3H8, and small amounts of C3H6, i-C5H12, and n-C5H12, are also observed. The distribution of these products is a strong function of the discharge power and of the gas pressure and residence time in the plasma. These experimental variables also affect both the rate of polymer deposition and the shape of the deposition profile along the reactor axis.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00566018
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  • 3
    Electronic Resource
    Electronic Resource
    Kinetics and mechanism of the decomposition of CS2, OCS, and SCl2 in a radiofrequency pulse discharge (1982)
    Springer
    Plasma chemistry and plasma processing 2 (1982), S. 331-339 
    Details
    ISSN: 1572-8986
    Keywords: Pulsed r.f. discharge ; kinetic spectroscopy ; identification of transient species ; rate coefficients
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The identification of transient species in r.f. discharges and measurement of rate coefficients for their reactions contributes to the understanding of the complex mechanisms in r.f. plasma chemistry. Using kinetic spectroscopy in conjunction with a short-duration r.f. pulse to investigate the decomposition of CS2, OCS, and SCl2 at low pressure, it has been shown that the predominant primary dissociation steps are CS2→CS+S, OCS→CO+S(1D), and SCl2→S+Cl+Cl. With OCS the most important subsequent steps involved the formation and removal of S2: S(1D)+OCS→CO+S2(a1Δ), S2(a1Δ)+M→S2(X3Σ)+M, (13), and 2S2+M→S4+M(15). Taking the previously published value of k12, computer simulation gave the rate coefficient values k13=6.4±2.4×108 mol−1 dm3 s−1 and k15=1.8±0.5×1013 mol−2 dm6 s−1 at 295±3 K.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00567560
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  • 4
    Electronic Resource
    Electronic Resource
    Effect of frequency on the deposition of microcrystalline silicon from tetrachlorosilane in low-pressure r.f. plasmas (1982)
    Springer
    Plasma chemistry and plasma processing 2 (1982), S. 341-351 
    Details
    ISSN: 1572-8986
    Keywords: r.f. plasma ; silicon deposition ; experimental
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The efficiency of reduction of silicon tetrachloride and the rate of deposition of Si in a low-pressure r.f. plasma was investigated at two frequencies (0.4 and 27 MHz) as a function of position with regard to the rf coil, pressure, and time of deposition. At 27 MHz the decomposition efficiency of silicon tetrachloride and the deposition rate of Si are about three times higher than at 0.4 MHz.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00567561
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  • 5
    Electronic Resource
    Electronic Resource
    The quenching of vibrationally excited N 2 + ions by various neutrals (1982)
    Springer
    Plasma chemistry and plasma processing 2 (1982), S. 353-359 
    Details
    ISSN: 1572-8986
    Keywords: Selected ion flow tube ; rate coefficients ; quenching ; ionic vibrational excitation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Using a selected ion flow tube, the quenching of the vibrational excitation of N 2 + (X, v≠0) by Ne, N2, O2, NO, and CO2 was investigated, and the following thermal quenching rate coefficients, kq, were obtained respectively (all in units of 10−10 cm3 sec−1): 0.045, 5, 1.2, ≤0.3, ≤1. For the charge transfer of N 2 + with O2, NO, and CO2, the respective rate coefficients (in units of 10−10 cm3 sec−1) 0.5, 3, and 7 were obtained independently of whether N 2 + (X) was vibrationally excited or not.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00567562
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  • 6
    Electronic Resource
    Electronic Resource
    Operating characteristics and energy distribution in transferred plasma arc systems (1982)
    Springer
    Plasma chemistry and plasma processing 2 (1982), S. 361-386 
    Details
    ISSN: 1572-8986
    Keywords: Transferred arc ; characteristics ; heat transfer ; experimental
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A specially designed plasma chamber was constructed to study the operating characteristics of a dc plasma-transferred arc of argon, struck between a fluid convective cathode and a water-cooled anode. The arc voltage increased markedly with arc length and with an increase in the inlet velocity of the argon flow past the cathode tip, and much less with an increase in current. Radiation from the plasma column to the chamber walls and transfer of energy to the anode were the two principal modes of transfer of the arc energy. The former was dominant in the case of long arcs and at high inlet argon velocities. At the anode, the major contribution was from electron transfer, which occurred on a very small area of the anode (∼5 mm in diameter). Convective heat transfer from the plasma was somewhat less. In all cases, the arc energy contributions to cathode cooling and to the exit gas enthalpy were small. From total heat flux and radiative heat transfer measurements, it was estimated that the plasma temperature just above the anode was in the range 10,000–12,000 K. Preliminary experiments with an anode consisting of molten copper showed that the arc root was no longer fixed but moved around continuously. The arc was othwewise quite stable, and its operating characteristics differed little from those reported for solid anodes, in spite of the greater extent of metal vaporization.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00567563
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  • 7
    Electronic Resource
    Electronic Resource
    Decomposition and polymerization of silicon tetrachloride in a microwave plasma. A mass-spectrometry investigation (1983)
    Springer
    Plasma chemistry and plasma processing 3 (1983), S. 235-248 
    Details
    ISSN: 1572-8986
    Keywords: Microwave plasma ; plasma polymerization ; silicon tetrachloride ; experimental
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Mass spectrometry has been used to analyze microwave-induced plasmas of silicon tetrachloride diluted in mixtures of hydrogen and argon. The effects of process parameters such as pressure in the reactor, power input, and the composition of the gas mixture were investigated. Sampling by a quadrupole mass-spectrometer along the gas stream showed that the reactions were initiated upstream where the reactants enter the plasma. It was found that the input power had an optimal value for the decomposition rate of SiCl4; above that optimum, recombination occurred downstream. Upstream the concentrations of SiCl4 decrease with increasing pressure in the range 1–10 torr, independent of the input power. The effect of admixing argon to the reaction mixture is discussed, and the results obtained are correlated to experimental results reported in previous works concerning silicon deposition from SiCl4 on a grounded substrate.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00566022
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