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  • Articles  (7)
  • Microwave plasma  (7)
  • 1985-1989  (5)
  • 1980-1984  (2)
  • 1960-1964
  • 1940-1944
  • Technology  (7)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 1 (1981), S. 377-395 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; polymerization ; plasma diagnostics
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The microwave plasmas of gaseous mixtures of methane-argon and propyleneargon were analyzed along the flow stream by the electrical double floating probe system, optical spectroscopy, and quadrupole mass spectrometry. The plasma variables measured and considered were current density, electric field strength, electron temperature, positive ion and electron concentrations, and concentration of pyrolyzed and polymerized species. The results indicate that an irreversible process of polymerization of the hydrocarbons takes place in the plasma. The polymerization process reaches its maximum conversion downstream beyond the microwave cavity. The extent of polymerization was correlated to the concentration of positive ions and electrons in the plasma.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 7 (1987), S. 341-348 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; chemical vapor deposition ; optical fibers
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract An atmospheric-pressure CVD method is described that uses microwave plasma for manufacturing preforms that are used in the production of optical fibers for telecommunication. The method takes advantage of the very high deposition efficiency and high deposition rates attained when using microwave plasma as well as of efficient glassing of oxide layers by means of the traditional system of burners. A simple theoretical model that allows calculations of close-to-reality plasma temperature profiles is presented.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 293-314 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; chlorinated hydrocarbon ; global kinetic analysis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The reaction of trichloroethylene (C2HCl3) with water vapor or molecular hydrogen has been studied in a low-pressure [ca. 5 Torr (0.67 kPa)] microwave plasma tubular flow reactor. The experimental apparatus included feed introduction systems, a microwave plasma reactor, and full product analysis by flame ionization and thermal-conductivity gas chromatography, mass spectrometry, and specific ion or pH detection for hydrogen chloride [HCl]. Conversions of C2HCl3 in the range 50 to almost 100% are achieved. Product analyses indicate conversion to HCl, some light hydrocarbons, nonparent chlorocarbons, and soot C(s). For the H2O case, carbon monoxide and trace carbon dioxide were produced in place of some light hydrocarbons and C(s). At least 85 mole % of chlorine (Cl) from the converted parent C2HCl3 forms thermodynamically stable HCl at parent conversions of 80% or more. The remaining chlorine was present as nonparent chlorocarbons. Preliminary kinetic analyses were performed. The global reaction in the plasma was found to follow one-half-order kinetic dependence on each of C2HCl3 and H2O or H2. Elementary plasma reaction mechanisms are presented to account for C2HCl3 conversion and the observed product distribution.
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  • 4
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 331-346 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; plasma etching ; cellulose ; coating distribution ; ESCA ; neutron activation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The effects of plasma etching on surface structure and chemistry of several papers have been investigated. Plasma etching acts like a fine microtome, continuously removing infinitesimally thin layers at the surface. It has allowed us to observe the internal structure of fibers, and interfiber bonding. The kinetics of plasma etching and its temperature dependence are reported; the thermal activation energy determined from the latter was found to be 0.15 eV. Possible applications of plasma etching techniques to study the structural and physical properites of paper in the z-direction and the distribution of coating material across the thickness of a paper sample are discussed.
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 5 (1985), S. 255-261 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; surface-wave discharge ; Stark broadening ; argon plasma
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The electron density of microwave-generated surface-wave discharges in argon have been measured using Stark broadening and calculated from the measured wavelengths of the standing surface wave. Results obtained from these two techniques compare well. The electron density varies from 1013 to 1014/cm3 for pressures ranging from 50 to 800 torr.
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  • 6
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 8 (1988), S. 263-280 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; gas-phase reactions ; mass spectrometer sampling ; discharge chemistry of SF6 with O2
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Processes which occur in microwave discharges of dilute mixtures of SF6 and O2 in He have been examined using a flow reactor sampled by a mass spectrometer. Two classes of experiments were performed. In the first set of experiments, mixtures containing 6×1011 cm−3 SF6, 6×1016 cm−3 He, and O2 in the range (0–3.6)×1013 cm−3 were passed through a 20-W 2450-MHz microwave discharge. The gas mixtures arriving at a sample point downstream from the discharge were examined for SF6, SF4, SOF2, SOF4, SO2F2, SO2, F, and O. In the second class of experiments, rate coefficients were measured for the reactions of SF4 with O and O2 and for the reaction of SF with O. The rate coefficient for the reaction of SF with O was found to be (4.2±1.5)×10−11 cm−3 s−1. SF4 was found to react so slowly with both oxygen atoms and oxygen molecules that only upper limits could be placed on the rate coefficients for these reactions. These values were 2×10−14 cm3 s−1 and 5×10−15 cm3 s−1 for reactions with O and O2 respectively. The observed distribution of products from the discharged mixtures is discussed in terms of the measured rate coefficients.
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 3 (1983), S. 235-248 
    ISSN: 1572-8986
    Keywords: Microwave plasma ; plasma polymerization ; silicon tetrachloride ; experimental
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Mass spectrometry has been used to analyze microwave-induced plasmas of silicon tetrachloride diluted in mixtures of hydrogen and argon. The effects of process parameters such as pressure in the reactor, power input, and the composition of the gas mixture were investigated. Sampling by a quadrupole mass-spectrometer along the gas stream showed that the reactions were initiated upstream where the reactants enter the plasma. It was found that the input power had an optimal value for the decomposition rate of SiCl4; above that optimum, recombination occurred downstream. Upstream the concentrations of SiCl4 decrease with increasing pressure in the range 1–10 torr, independent of the input power. The effect of admixing argon to the reaction mixture is discussed, and the results obtained are correlated to experimental results reported in previous works concerning silicon deposition from SiCl4 on a grounded substrate.
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