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  • Wiley-Blackwell  (2)
  • American Chemical Society
  • American Institute of Physics (AIP)
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  • 1
    Electronic Resource
    Electronic Resource
    Deposition of cadmium sulphide thin films from the single-source precursor bis(diethylmonothiocarbamato)cadmium(II) by low-pressure metalorganic chemical vapour deposition (1997)
    New York, NY [u.a.] : Wiley-Blackwell
    Advanced Materials for Optics and Electronics 7 (1997), S. 311-316 
    Details
    ISSN: 1057-9257
    Keywords: monothiocarbamate ; MOCVD ; cadmium sulphide ; precursor ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: Thin films of CdS were grown by low-pressure metalorganic chemical vapour deposition (LP-MOCVD, 10-2 Torr) on GaAs(100) and borosilicate glass using the novel single-source precursor bis(diethylmonothiocarbamato)cadmium(II). The deposition of CdS was observed at substrate temperatures of 300 °C and above. Uniform adherent films of CdS were grown on GaAs(100) at temperatures between 350 and 450°C. CdS films deposited on glass were generally transparent with small crystallites (∽50 nm). Films were characterised by X-ray diffraction and scanning electron microscopy and shown to be of hexagonal phase. A band gap of 2.39 eV was measured for the films of CdS. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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    Paper (German National Licenses)
  • 2
    Electronic Resource
    Electronic Resource
    Vapour Pressure Studies of Some Nitrogen Donor Adducts of Dimethylzinc Used in the Deposition of Materials by MOCVD (1997)
    New York, NY [u.a.] : Wiley-Blackwell
    Advanced Materials for Optics and Electronics 7 (1997), S. 117-121 
    Details
    ISSN: 1057-9257
    Keywords: precursor ; MOCVD ; vapour pressure ; adduct ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: The vapour pressures of mixtures of dimethylzinc with triethylamine (1), 1,3,5-trimethyl- (2) and 1,3,5-triethylhexahydro-1,3,5-triazine (3) have been studied using static measurement at various mole ratios of ligand to alkyl at 0°C. The results obtained are useful in assessing the suitability of these compounds as precursors for the deposition of group-12-containing materials by MOCVD. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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    Paper (German National Licenses)
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