Publication Date:
2013-09-13
Description:
Junku Liu, Qunqing Li, Mengxin Ren, Lihui Zhang, Mo Chen et al. Charging of insulating substrates is a common problem during Electron Beam lithography (EBL), which deflects the beam and distorts the pattern. A homogeneous, electrically conductive, and transparent graphene layer is used as a discharge layer for EBL processes on insulating substrates. The EBL reso ... [Appl. Phys. Lett. 103, 113107 (2013)] published Thu Sep 12, 2013.
Print ISSN:
0003-6951
Electronic ISSN:
1077-3118
Topics:
Physics
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