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  • Artikel  (3)
  • Artikel: DFG Deutsche Nationallizenzen  (3)
  • silicon  (3)
  • Springer  (3)
  • 2020-2022
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  • Artikel  (3)
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  • Artikel: DFG Deutsche Nationallizenzen  (3)
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  • Springer  (3)
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  • 1
    Digitale Medien
    Digitale Medien
    Springer
    Plasma chemistry and plasma processing 1 (1981), S. 201-215 
    ISSN: 1572-8986
    Schlagwort(e): SF6 discharge ; silicon ; mass spectroscopy
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Technik allgemein
    Notizen: Abstract Polycrystalline silicon wafers were etched in dc discharges of SF6. SFx species were extracted from the discharges and measured with a mass spectrometer. A systematic procedure was used to measure the SF x + signals such that they are indicators of events in the discharge close to the sample undergoing etching. The picture that emerges is remarkably simple and shows the relative stability of several SFx species including SF6, SF4, SF2, and SF which are shown to be extracted from the discharge both in the presence and absence of the silicon sample. When silicon is being etched on the cathode of the discharge cell, the only significant additional products are SiF4 and S2F2. A comparison of blank and sample data for opposite substrate polarities shows that there is only a small cation-assisted etching effect and suggests that ions do not play an important role in the etching of silicon by SF6 discharges.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Springer
    Plasma chemistry and plasma processing 2 (1982), S. 399-419 
    ISSN: 1572-8986
    Schlagwort(e): Plasma reduction ; silicon ; modeling and experiments
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Technik allgemein
    Notizen: Abstract The conversion of SiCl4 into Si has been achieved from reduction by a hydrogen plasma produced in an arc heater. As the results (conversion yield about 60%) are far from chemical equilibrium predictions, a kinetic model is proposed using the few kinetic data available in the literature and a temperature history of the reactants deduced from measurements of the temperatures and velocities of the flowing chemical mixture.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 3
    ISSN: 1572-8986
    Schlagwort(e): Plasma ; silicon ; photovoltaic ; thermodynamic calculation
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Technik allgemein
    Notizen: Abstract After a comprehensive review of the bibliography on the production of solar grade silicon by various methods and starting from various raw materials, we develop the thermodynamic calculations of the reduction (with hydrogen or sodium) and of the pyrolysis of SiO2, SiCl4, SiF4, SiH4, and SiHCl3. For temperatures varying from 1000 to 6000 K at atmospheric pressure or at 10−2 atm, we present the corresponding composition diagrams together with the corresponding calculated reduction rates and conversion to silicon and the enthalpies required to heat the various mixtures considered up to 6000 K. As a conclusion we attempt to define, through our calculations, in connection with the prices of the raw materials and with the few experiments developed for the production of silicon under plasma conditions, the best raw materials for treatment by plasma to obtain silicon: SiH4 is probably best for obtaining high-purity silicon, and SiCl4 the cheapest.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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