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Study of pulsed laser deposition of RuO2 and SrRuO3 thin films

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Abstract.

In this study, the pulsed laser ablation of RuO2 and SrRuO3 (SRO) is investigated by observing the fluorescence from excited atoms in the plume by using a framing streak camera. Vaporization, phase explosion and boiling are suggested to play the main roles in the processes for the interaction between the laser beam and target. Collisions and adiabatic expansion are also suggested before particles move forward with shifted Maxwellian spatial distribution. In O2 pressure, numerous collisions between fast and slow atoms occur and result in the exchange of speeds. The structural and electrical (conductivity and work-function) properties of RuO2 and SRO thin films are measured. Epitaxial SRO growth was obtained at growth temperatures down to 350 °C. Ferroelectric and high- dielectric thin-film capacitors with RuO2 or SRO thin film electrode are also studied.

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Received: 21 July 1999 / Accepted: 11 September 1999 / Published online: 28 December 1999

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Fang, X., Kobayashi, T. Study of pulsed laser deposition of RuO2 and SrRuO3 thin films . Appl Phys A 69 (Suppl 1), S587–S590 (1999). https://doi.org/10.1007/s003390051481

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  • DOI: https://doi.org/10.1007/s003390051481

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