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Laser photolytic deposition of molybdenum and tungsten thin film microstructures

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Abstract

We have deposited thin metal films of Mo and W with sub-μm lateral resolution using the photodissociation of the carbonyls by the frequency doubled radiation of an Arion laser at cw and ps-pulse operation, respectively. In both regimes similar curves are obtained for the intensity dependence of the deposition rate. No difference was observed for the lateral resolution using cw or ps-pulse irradiation. Measurements of the deposition rate as a function of the spot size indicate that the decomposition occurs in the adsorbed phase.

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Authors and Affiliations

  1. Central Institute of Optics and Spectroscopy, Academy of Sciences of the GDR, Rudower Chaussee 6, DDR-1199, Berlin-Adlershof, German Democratic Republic

    W. Radloff, E. Below, H. Dürr & V. Stert

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  1. W. Radloff
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  2. E. Below
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  3. H. Dürr
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  4. V. Stert
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Radloff, W., Below, E., Dürr, H. et al. Laser photolytic deposition of molybdenum and tungsten thin film microstructures. Appl. Phys. A 50, 233–235 (1990). https://doi.org/10.1007/BF00343423

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  • DOI: https://doi.org/10.1007/BF00343423

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