Summary
Poly-p-trimethylsilylphenylmethacrylate(75)-co-glycidylmethacrylate (25) containing aromatic bisazides exhibits uv sensitivity as a negative type photoresist. Sensitometric data have been evaluated. The pressure-dependant reactivity under the conditions of oxygen reactive ion etching was determined.
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Reinisch, G., Wigant, L., Krüger, R. et al. Si-containing copolymer of 2,3-epoxypropyl-1-methacrylate. Polymer Bulletin 27, 565–569 (1992). https://doi.org/10.1007/BF00300605
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DOI: https://doi.org/10.1007/BF00300605