Abstract
The phase formation process of NiCr(37:63) thin films has been investigated using the x-ray diffraction method. The films were deposited onto Si-wafers by means of d.c. magnetron sputtering. The structure of the as-deposited layers was amorphous. As a result of subsequent thermal annealing the crystallization process took place characterized by the formation of b.c.c. Cr-rich solid solution, metastable σ-NiCr-phase, and f.c.c. Ni-rich solid solution, respectively. Besides lattice constants, grain sizes and texture of the formed phases were determined.
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Received: 15 July 1997 / Revised: 2 February 1998 / Accepted: 5 February 1998
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Pitschke, W., Brückner, W. Phase formation process of sputtered NiCr(37:63) thin films. Fresenius J Anal Chem 361, 608–609 (1998). https://doi.org/10.1007/s002160050965
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DOI: https://doi.org/10.1007/s002160050965