Abstract
Optical spectra of molecular species sputtered from nitrogen, and carbon-oxygen implanted silicon are analysed and compared with the predictions of the accompanying theoretical paper. The dominant emission in both systems corresponds to the extensive rovibrational excitation predicted for a sputtering source. The molecules N2, CO, and/or CO+ appear to be the primary electronically excited species. The N2 excitation mechanism in the nitrogen-silicon system is suggested to be similar to that producing the Lewis-Rayleigh afterglow, namely, the associative reaction N(4S0) + N(4S0)⇌N 52 ∑ + g followed by the stabilization mechanism N 52 ∑ + g +M⇌N2B3 Π g +M, whereM represents the surface. Additional weak SiNB2 ∑ +, N2C3 Π u and N 52 B2 ∑ + u excitation is analysed, and its origin discussed.
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Snowdon, K.J., Hentschke, R., Heiland, W., Hertel, P.: Z. Phys. A — Atoms and Nuclei318, 261 (1984)
Snowdon, K.J., Heiland, W., Taglauer, E.: Phys. Rev. Lett.46, 284 (1981)
Snowdon, K.J., Heiland, W., Taglauer, E.: Abstracts, XII. International Conference on Physics Electronic Atomic Collisions. Vol. 2, p. 1007. Gatlinburg: ICPEAC 1981
Loxton, C.M., Tsong, I.S.T.: Phys. Rev. Letts.50, 1331 (1983)
Snowdon, K.J., Heiland, W.: Phys. Rev. Letts.50, 1332 (1983)
MacDonald, R.J., Heiland, W., Taglauer, E.: Appl. Phys. Lett.33, 950 (1978)
Loftus, A., Krupenie, P.H.: J. Phys. Chem. Ref. Data6, 113 (1977)
Krupenie, P.H., Weissman, S.: J. Chem. Phys.43, 1529 (1965)
Singh, R.B., Rai, D.K.: Indian J. Pure Appl. Phys.4, 102 (1966)
Oddershede, J., Elander, N.: J. Chem. Phys.65, 3495 (1976)
Huber, K.P., Herzberg, G.: Molecular spectra and molecular structure IV. Constants of diatomic molecules. New York: van Nostrand Reinhold 1979
Pearse, R.W.B., Gaydon, A.G.: The identification of molecular spectra. 4th Edn. London: Chapman and Hall 1976
Singh, M., Bredohl, H., Remy, Fr., Dubois, I.: J. Phys. B6, 2656 (1973)
Chen, S.T., Anderson, R.J.: Phys. Rev. A12, 468 (1975)
Peterson, J.R., Moseley, J.T.: J. Chem. Phys.58, 172 (1973)
Bredohl, H., Dubois, I., Houbrechts, Y., Singh, M.: Can. J. Phys.54, 680 (1976)
Mulliken, R.S.: Rev. Mod. Phys.3, 89 (1931)
Becker, K.H., Fink, E.H., Groth, W., Jud, W., Kley, D.: Proceedings 7th International Conference on Physics Electronic and Atomic Collisions, p. 35. Amsterdam: ICPEAC 1971
Thomas, E.W., Efstathiou, L.: Nucl. Instrum. Methods B2, 479 (1984)
Snowdon, K.J., Thomas, E.W.: Private communication
Sputtering by particle bombardment I. Behrisch, R. (ed.). Topics in Applied Physics. Vol. 47. Berlin, Heidelberg, New York: Springer-Verlag 1981
Bazhin, A.I., Rausch, E.O., Thomas, E.W.: J. Chem. Phys.65, 3897 (1976)
The similarity of the (2, 2) and (3, 3) distributions should not be overemphasized, since the (3, 3) distribution was obtained from a spectral feature not significantly larger than the background structure
Datz, S.: In: Inelastic particle-surface collisions. Taglauer, E., Heiland, W. (eds.). Springer Series in Chemical Physics. Vol.17, p. 142. Berlin, Heidelberg, New York: Springer Verlag 1981
Snowdon, K., Onsgaard, J., Tougaard, S.: Nucl. Instrum. Methods B2, 797 (1984)
Loxton, C.M., Tsong, I.S.T., Reed, D.A.: Nucl. Instrum. Methods B2, 465 (1984)
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Some of the measurements reported here were performed while the authors were affiliated with the Max-Planck-Institute for Plasmaphysik, Garching. The active encouragement for this work of Dr. R. Behrisch is gratefully acknowledged, as are fruitful discussions with Dr. E. Taglauer and technical assistance of F. Schuster, H. Hupfloher and K. Gehringer.
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Snowdon, K.J., Heiland, W. Rotational and vibrational excitation of sputtered diatomic molecules. Z Physik A 318, 275–284 (1984). https://doi.org/10.1007/BF01418084
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DOI: https://doi.org/10.1007/BF01418084