Abstract
The temperature coefficients (TCR) of vacuum-deposited thin-metal-film resistors were measured in vacuum, air, argon, and silicone oil, and different characteristics were obtained. The resistors were made by evaporating a nickel-chrome alloy (Nichrome 80 to 20) in vacuum onto ceramic substrates to produce a 500-ohms-persquare film. Measurements were made of films which were uncoated and of films which were coated with a protection layer of silicone monoxide in thicknesses from 5000 to 10000 å.
When measured under vacuum, the resistors displayed a TCR which was lower than that obtained in air, argon, or silicone oil. In an argon environment, the resistors had lower TCR characteristics than they had in air or silicone oil. Even when the resistor films were protected by a 10000-å-thick layer of silicone monoxide, their TCR behavior differed in different gas environments.
Most of the TCR's measured in the temperature range from −55Ω to +150Ω C were between 5 and 50 parts per million per degree centigrade.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
Author information
Authors and Affiliations
Additional information
The author would like to express his appreciation to the Scientific Instruments Department of RCA, Camden, New Jersey, and especially to Mr. J.J.Byrd for taking the electron micrographs (Fig. 1 and 2) and Messrs. E.T.Casterline, R.M.Minton, and A.Dammig, of the author's Vacuum Deposition Laboratory of the RCA Micromodule Department, Somerville, New Jersey, for their active assistance throughout the course of these developments and research activities, part of which is reported in this paper.
Rights and permissions
About this article
Cite this article
Schwarz, H. Temperature coefficient of resistance of thin metal films on ceramic surfaces. Z. Physik 162, 402–409 (1961). https://doi.org/10.1007/BF01331525
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF01331525