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Monitoring the deposition of an interference film by differential reflection of light

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Abstract

The change in the reflection (differential reflection) of light from an interference film as a result of the deposition of an ultrathin layer on it is investigated. Formulas describing the differential reflection around the reflectivity minima and maxima of the film are obtained by a perturbation method. It is shown that these formulas and the corresponding differential measurements can be used for an easy and unambiguous determination of the thickness and refractive index not only of ultrathin surface layers but also of the interference films themselves. The proposed method is especially convenient for monitoring the deposition of thin-film structures.

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Authors and Affiliations

  1. Institute of Physics, Tartu

    P. V. Adamson

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  1. P. V. Adamson
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Additional information

Pis’ma Zh. Tekh. Fiz. 24, 78–86 (October 26, 1998)

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Adamson, P.V. Monitoring the deposition of an interference film by differential reflection of light. Tech. Phys. Lett. 24, 822–825 (1998). https://doi.org/10.1134/1.1262280

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  • DOI: https://doi.org/10.1134/1.1262280

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