Abstract
We review the important features of the right-angle X-junction diffraction model and discuss both its theoretical framework and its validity range. In addition, we present explicit new results from BPM calculations that show that the analytical model aptly describes the dominant physical processes involved and provides bounds on the numerical results. We also address some misinterpretations of the model that have recently appeared in the literature.
Similar content being viewed by others
References
J. D.LOVE and F.LADOUCEUR,Electron. Lett. 28(3) (1992) 221.
F.LADOUCEUR and J. D.LOVE,Opt. Quantum Electron. 24 (1992) 1373.
F.MACKENZIE, C. J.BEAUMONT, M.NIELD and S. A.CASSIDY,Electron. Lett. 28(20) (1992) 1919.
A. D.CAPOBIANCO, B.COSTANTINI and C. G.SOMEDA,Electron. Lett. 29(9) (1993) 753.
K.ARETZ and H.BÜLOW,Electron. Lett. 25(11) (1989) 730.
T. O. MURPHY, R. W. IRVIN and E. J. MURPHY,Proceedings Integrated Photonics Research, San Francisco, California, February 1994, p. 184.
A. W.SNYDER and J. D.LOVE,Optical Waveguide Thoery (Chapman and Hall, London, 1983).
F.LADOUCEUR, J. D.LOVE and I. M.SKINNER,IEEE Proc. Pt J 138(4) (1991) 253.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Hewlett, S.J., Ladouceur, F. & Love, J.D. On the right-angle X-junction diffraction model. Opt Quant Electron 27, 261–266 (1995). https://doi.org/10.1007/BF00631752
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00631752