High-Quality YBa₂Cu₃O_7−x Films with CeO₂/YSZ Buffer Layers on 2-Inch Si Wafers Deposited by Pulsed Laser

Abstract

The pulsed laser deposition (PLD) process is shown for in situ reproducibly fabricating YBa₂Cu₃O_7−x (YBCO) superconducting films with yttrium-stabilized zirconia (YSZ) and CeO₂ buffer layers, nonsuperconducting crystalline YBa₂Cu₃O_7−x (YBCO*) passivation layer, and silver contact film on 2-inch silicon wafers. Variations of less than ±7% in film thickness have been obtained for this multilayer growth over the whole wafer. The YBCO films on 2-inch silicon wafers have homogeneous superconducting properties with zero resistance temperature T _c0 from 88.4 K to 88.9 K. and critical current density J _c at 77 K and zero field from 2.5 × 10⁶ to 7× 10⁶ A/cm². The YSZ, CeO₂ and YBCO layers grow epitaxially on silicon wafers. Full widths at half maximum (FWHMs) of (113) reflections of 40 nm thick YBCO layer from φ-scan patterns are only 1.71° and 1.85° corresponding to the center and edge of the wafer, respectively. These results are very promising for developing high-quality high-T _c superconducting devices on large-area silicon wafers.