Abstract
Procedure and results of instrumental neutron activation analysis of very pure silicon wafers of 12.5 and 15 cm diameter are described. It is shown that the determined contaminations are mainly present on the surface or in a surface layer of the wafers. With the method outlined here very low limits of detection for a large number of elements are obtained. The analyses also confirmed that two routine process cleaning procedures do not contaminate the surface of the waters.
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Verheijke, M.L., Jaspers, H.J.J. & Hanssen, J.M.G. Neutron activation analysis of very pure silicon wafers. Journal of Radioanalytical and Nuclear Chemistry, Articles 131, 197–214 (1989). https://doi.org/10.1007/BF02046623
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DOI: https://doi.org/10.1007/BF02046623