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On depth profiling from PIXE yields

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Abstract

The capabilities of a standard multiparametric fitting procedure for extracting concentration profiles from a set of PIXE yield measurements are evaluated for both: real Zn depletion profiles in an initially homogeneous Ag 3 at % Zn alloy, annealed under vacuum, and simulated sinusoidal profiles. The comparison with the profiles obtained via iteration plus smoothing shows that multiparametric fitting is more performing.

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Authors and Affiliations

  1. SRMP/D. Tech, CEN Saclay, 91191, Gif sur Yvette, France

    P. Regnier

  2. Institut de Physique Nucléaire, B.P. no 1, 91406, Orsay Cedex, France

    I. Brissaud

Authors
  1. P. Regnier
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  2. I. Brissaud
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Regnier, P., Brissaud, I. On depth profiling from PIXE yields. Journal of Radioanalytical and Nuclear Chemistry Letters 117, 111–120 (1987). https://doi.org/10.1007/BF02165319

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  • DOI: https://doi.org/10.1007/BF02165319

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