Abstract
The formation of nanocrystals after implantation of silver alone as well as together with the halogen ions Cl, Br and I into a SiO2 layer of about 100 nm was studied by X-ray diffraction and transmission electron microscopy. The co-implantation of Ag and Cl or Br results in the formation of cubic AgX crystals which are stable in size under annealing. The co-implantation of Ag and I as well as single Ag implantation result in Ag crystallites, which grow under annealing. The annealing procedure causes a redistribution of the particles within the layer.
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Matz, W., Pham, M.T. & Mucklich, A. Nanometre-sized silver halides entrapped in SiO2 matrices. Journal of Materials Science 33, 155–159 (1998). https://doi.org/10.1023/A:1004310100054
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DOI: https://doi.org/10.1023/A:1004310100054