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Corrosion behaviour of TiN films obtained by plasma-assisted chemical vapour deposition

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Abstract

Titanium nitride (TiN) coatings with a dense structure were prepared on high-speed steel by plasma-assisted chemical vapour deposition (PACVD). The electrochemical polarization measurement of TiN coating was compared with that of the uncoated substrate. It was found that the TiN coating had a higher corrosion potential, and a lower corrosion rate (current density), about three orders of magnitude less than for the steel substrate. The major corrosion mechanism of TiN was pitting corrosion through surface defects and/or open pores. The number and size of pits decreased with the chlorine content of the film. The TiN coating deposited by PACVD, regardless of the amount of residual chlorine, proved to be a good anti-corrosion coating on a steel substrate.

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Authors and Affiliations

  1. Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology, 373-1 Kusong Dong, Yusong Gu, Taejon, Korea

    C. B. In, S. P. Kim & J. S. Chun

Authors
  1. C. B. In
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  2. S. P. Kim
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  3. J. S. Chun
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In, C.B., Kim, S.P. & Chun, J.S. Corrosion behaviour of TiN films obtained by plasma-assisted chemical vapour deposition. JOURNAL OF MATERIALS SCIENCE 29, 1818–1824 (1994). https://doi.org/10.1007/BF00351301

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