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Study of growth rate and failure mode of chemically vapour deposited TiN, TiCxNy and TiC on cemented tungsten carbide

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Abstract

The effects of deposition temperature and mole ratio of CH4 to TiCl4 on the growth rate of titanium compound coatings were investigated. Activation energies of TiN, TiC x N y and TiC deposition reactions of 4.8×104, 1.9×105 and 2.8×105 J mol−1, respectively, were obtained experimentally. The carbon content of TiC x N y deposit was increased as the CH4 flow rate and deposition temperature increased. It was found that TiC x N y grain size was finer than TiC and TiN.

The cutting temperatures of TiN-coated and TiC-coated tools were 10% (TiN) and 20% (TiC) lower than that of uncoated tools. Feed force and reaction force of coated tools were 30% and 18% less than those of uncoated tools, respectively. The dominant failure mode of coated tools was due to the microchipping of the cutting edge.

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References

  1. P. O. Snell, Jernkont, Ann. 154 (1970) 413.

    Google Scholar 

  2. W. S. Schintlmeister and O. Pacher, J. Vac. Sci. Technol. 12 (1975) 743.

    Google Scholar 

  3. T. Sadahiro, T. Cho and S. Yamaya, J. Japan Inst. Metals 41 (1977) 542.

    Google Scholar 

  4. G. F. Wakefield and J. A. Bloom, Proceedings of the 3rd International Conference on Chemical Vapour Deposition, edited by F. A. Glaski (American Nuclear Society, Salt Lake City, Utah, 1972) p. 397.

    Google Scholar 

  5. M. Lee and M. H. Richman, J. Electrochem. Soc. 120 (1973) 993.

    Google Scholar 

  6. Idem, Met. Technol. (Dec.) (1974) 538.

  7. P. Duwez and F. Odell, J. Electrochem. Soc. 97 (1950) 299.

    Google Scholar 

  8. G. Boothroyd, “Fundamentals of Metal Machining and Machine Tools” (McGraw-Hill, New York, 1975).

    Google Scholar 

  9. W. A. Bryant, J. Mater. Sci. 12 (1977) 1285.

    Google Scholar 

  10. R. E. Taylor and J. Morreale, J. Amer. Ceram. Soc. 47 (1964) 69.

    Google Scholar 

  11. W. Schintlemeister, O. Pacher, K. Pfaffinger and T. Raine, J. Electrochem. Soc. 123 (1976) 924.

    Google Scholar 

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Authors and Affiliations

  1. Department of Materials Science, Korea Advanced Institute of Science and Technology, Seoul, Korea

    J. S. Cho, S. W. Nam & J. S. Chun

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  1. J. S. Cho
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  2. S. W. Nam
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  3. J. S. Chun
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Cho, J.S., Nam, S.W. & Chun, J.S. Study of growth rate and failure mode of chemically vapour deposited TiN, TiCxNy and TiC on cemented tungsten carbide. J Mater Sci 17, 2495–2502 (1982). https://doi.org/10.1007/BF00543880

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  • DOI: https://doi.org/10.1007/BF00543880

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