Abstract
Crown conformers of O-carboxymethylated calix[4]resorcinarenes (CRA-CMs) bearing four perfluorooctyl- and octylazobenzene residues at the lower rim of the cyclic skeleton were synthesized to investigate the resistance to desorption of CRA-CMs forming self-assembled monolayers on aminosilylated silica substrates and the surface energy photocontrol based on E- to-Z photoisomerization of the azobenzene moiety. In comparison with CRA-CM monolayers on silica substrates, the desorption of CRA-CMs on the aminated substrate was remarkably suppressed even when CRA-CM monolayers were sonicated in polar solvents and even in water. The high desorption-resistance was attributable to multi-point adsorption of CRA-CMs through COOH/NH2 interactions. UV-Vis spectral studies revealed that CRA-CM substituted with p-octylazobenzene exhibited high E- to-Z photoisomerizability up to 92% in self-assembled monolayers, while less photoisomerizability was observed for CRA-CM bearing p-perfluorooctylazobenzenes due to the steric hindrance of the larger perfluoroalkyl chains. Photoinduced changes of contact angles for water up to 8.3° were observed for a CRA-CM monolayer.
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Ichimura, K., Oh, SK., Fujimaki, M. et al. Convenient Preparation of Self-Assembled Monolayers Derived from Calix[4]resorcinarene Derivatives Exhibiting Resistance to Desorption. Journal of Inclusion Phenomena 35, 173–183 (1999). https://doi.org/10.1023/A:1008126427392
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DOI: https://doi.org/10.1023/A:1008126427392