Catalyst patterning methods for surface-bound chemical vapor deposition of carbon nanotubes

Abstract

We present three different catalyst preparation and patterning techniques for plasma-enhanced chemical vapor deposition of carbon nanostructures from acetylene and ammonia mixtures. The different merits and potential areas of application are highlighted for each technique as compared to the benchmark of e-beam-lithography patterning. Maskless, focused ion beam written Pt can nucleate aligned carbon nanofibers, thereby allowing a sub-100 nm lateral resolution on non-planar substrate geometries combined with an in-situ monitoring. Ion beam milling additionally enables the pre-shaping and marking of the substrate, which is shown for the growth of individual nanofibers on the apex of commercial scanning probe tips. Pulsed electrochemical deposition was used to form Ni and Fe catalyst islands of controlled size and density. This is also demonstrated on complex substrate geometries such as carbon cloth. Nanocontact printing was employed to deposit a highly purified Co colloid in regular patterns with feature sizes down to 100 nm onto silicon wafers for low cost patterning over large areas. We analyze the catalyst restructuring upon exposure to elevated temperatures for each technique and relate this to the nucleated nanofiber dimensions and array densities. The flexibility in catalyst and substrate material allows a transfer of our achievements to catalyst-assisted growth of nanostructures in general facilitating their hierarchical device integration and future application.