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FTIR absorption spectroscopy as a novel method for thin film deposition rate measurement

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Abstract

The precise measurement of the deposition rate is an essential part of successful fabrication of thin films, both organic and inorganic ones. Established methods using quartz oscillators are known to possess a variety of disadvantages, foremost a very limited lifetime. Here, we report on a novel measurement technique for the deposition rate of organic thin films, based on Fourier-transform infrared spectroscopy. Different organic species have been uniquely identified with similar accuracy compared to standard methods. The lifetime of the system can be vastly extended compared to quartz oscillators and multiple organic species can be detected simultaneously, allowing for co-deposition of materials with only one detector necessary. This method can be used for both quantitative as well as qualitative analysis of deposition or doping processes.

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References

  1. J. Liebig, Justus Liebigs Ann. Chem. 98, 132 (1856)

    Article  Google Scholar 

  2. J.E. Lilienfeld, Electrical current control mechanism. Canadian Patent 272,437A, 1927

  3. W.B. Shockley, Semiconductor amplifier. US Patent 2,502,488A, 1950

  4. W.B. Shockley, Circuit element utilizing semiconductive material. US Patent 2,569,347A, 1951

  5. C. Buzea, K. Robbie, Rep. Prog. Phys. 68, 385 (2005)

    Article  ADS  Google Scholar 

  6. G. Sauerbrey, Z. Phys. 155, 206 (1959)

    Article  ADS  Google Scholar 

  7. C.-S. Lu, O. Lewis, J. Appl. Phys. 43(11), 4385 (1972)

    Article  ADS  Google Scholar 

  8. M.M. Coleman, ACS Polym. Prepr. 17(2), 732 (1976)

    Google Scholar 

  9. X.-C. Shen, H.-J. Ye, W. Lu, Mikrochim. Acta 95(1–6), 357 (1988)

    Article  ADS  Google Scholar 

  10. J.M. Legal, M. Manfait, T. Theophanidis, J. Mol. Struct. 242, 397 (1991)

    Article  ADS  Google Scholar 

  11. J. Choi, S. Kim, J. Kim, J. Mech. Sci. Technol. 19(6), 1329 (2005)

    Article  Google Scholar 

  12. S. Sheng, T. Takehara, D.K. In, J. Soc. Inf. Disp. 13(2), 99 (2005)

    Article  Google Scholar 

  13. B. Ploss, S. Bauer, Sens. Actuators A 25–27, 407 (1991)

    Article  Google Scholar 

  14. J. Piotrowski, W. Gawron, Infrared Phys. Technol. 38, 63 (1997)

    Article  ADS  Google Scholar 

  15. M. Hesse, H. Meier, B. Zeeh, Spektroskopische Methoden in der organischen Chemie, 5th edn. (Georg Thieme, Stuttgart, 1995)

    Google Scholar 

  16. J. Shinar, Organic Light-Emitting Devices: A Survey, 1st edn. (Springer, New York, 2004)

    Book  Google Scholar 

  17. Y. Sakurai, Y. Hosoi, H. Ishii, Y. Ouchi, G. Salvan, A. Kobitski, T.U. Kampen, D.R.T. Zahn, K. Seki, J. Appl. Phys. 96(10), 5534 (2004)

    Article  ADS  Google Scholar 

  18. E. Polshin, B. Aernouts, W. Saeys, F. Delveaux, F.R. Delveaux, D. Saison, M. Hertog, B.M. Nicolai, J. Lammertyn, J. Food Eng. 106, 188 (2011)

    Article  Google Scholar 

  19. S.N. Jha, S. Gunasekaran, J. Food Eng. 101, 337 (2010)

    Article  Google Scholar 

  20. D.M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing, 1st edn. (Noyes, Westwood, 1998)

    Google Scholar 

  21. A. Beer, Ann. Phys. Chem. 86, 78 (1852)

    Article  ADS  Google Scholar 

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Acknowledgements

We gratefully acknowledge scientific advice from H.-H. Johannes, R. Caspary and W. Kowalsky, technological support by Applied Materials and financial support by the German Federal Ministry of Education and Research (BMBF).

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Authors and Affiliations

  1. Institut fuer Hochfrequenztechnik, Technische Universität Braunschweig, 38106, Braunschweig, Germany

    Thomas Reichenbacher, Simon Schuetz, Ilja Stasewitsch & Stephan Fabig

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  1. Thomas Reichenbacher
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  2. Simon Schuetz
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  3. Ilja Stasewitsch
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  4. Stephan Fabig
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Correspondence to Thomas Reichenbacher.

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Reichenbacher, T., Schuetz, S., Stasewitsch, I. et al. FTIR absorption spectroscopy as a novel method for thin film deposition rate measurement. Appl. Phys. A 114, 1295–1301 (2014). https://doi.org/10.1007/s00339-013-7940-8

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  • DOI: https://doi.org/10.1007/s00339-013-7940-8

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