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Title: Near equilibrium growth of silicon by CVD I. The Si-Cl-H system
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Journal of Crystal Growth [0022-0248] Bloem, J yr:1983


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Users interested in this article also expressed an interest in the following:
1. van der Putte, P. "Growth and etching of silicon in chemical vapour deposition systems; The influence of thermal diffusion and temperature gradient." Journal of Crystal Growth 31.C (1975): 299-307. Link to Full Text for this item Link to SFX for this item
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