ExLibris header image
SFX Logo
Title: Oxygen distribution in silicon melt during a standard Czochralski process studied by sensor measurements and comparison to numerical simulation
Source:

Journal of Crystal Growth [0022-0248] Mühe, A yr:1999


Collapse list of basic services Basic
Full text
Full text available via EZB-NALI5-00465 Elsevier Archive NL
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.