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Title:
RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition
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Applied Surface Science [0169-4332] Chopade, S S yr:2013
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author:
Chopade, S S
Barve, S A
Chand, N
Deo, M N
Biswas, A
Rai, Sanjay
Lodha, G S
Rao, G M
Patil, D S
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author:
Chopade, S S
Barve, S A
Chand, N
Deo, M N
Biswas, A
Rai, Sanjay
Lodha, G S
Rao, G M
Patil, D S
last name
initials
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author:
Chopade, S S
Barve, S A
Chand, N
Deo, M N
Biswas, A
Rai, Sanjay
Lodha, G S
Rao, G M
Patil, D S
last name
initials
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