Sticking, adsorption, and absorption of atomic H on Cu(110)

U. Bischler, P. Sandl, E. Bertel, T. Brunner, and W. Brenig
Phys. Rev. Lett. 70, 3603 – Published 7 June 1993
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Abstract

The sticking coefficient of atomic hydrogen at TG=1815 K on a Cu(110) surface has been determined to be 18%. In addition to the buildup of a chemisorption layer the absorption of atomic H into subsurface sites is observed. The subsurface sites are thermally less stable than the chemisorption sites. Model calculations for the phononic energy transfer and estimates for the parallel momentum transfer as well as for electron-hole pair excitation indicate that the first two mechanisms dominate the accommodation process.

  • Received 2 November 1992

DOI:https://doi.org/10.1103/PhysRevLett.70.3603

©1993 American Physical Society

Authors & Affiliations

U. Bischler, P. Sandl, and E. Bertel

  • Max-Planck-Institut für Plasmaphysik, EURATOM-Association, D-8046 Garching, Germany

T. Brunner and W. Brenig

  • Institut für Theoretische Physik, Technische Universität München, D-8046 Garching, Germany

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Vol. 70, Iss. 23 — 7 June 1993

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