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Observation of inverted island-substrate step structures in heteroepitaxial growth: Gd on W(100)

R. G. White, M. H. Lee, N. P. Tucker, S. D. Barrett, and P. W. Murray
Phys. Rev. B 56, R10071(R) – Published 15 October 1997
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Abstract

Scanning tunneling microscopy has been used to study the growth of Gd on W(100) in which an inverted island-substrate step structure is seen for deposition at elevated temperatures. This results in lower step heights than would be the case if the islands followed the step morphology, and a reduction of the exposure of high-energy Gd faces. Deposition at lower temperatures results in flat islands whose size is related to the deposition temperature, with the data supporting a local Stranski-Krastinov growth mechanism. Low-energy electron diffraction indicates that the islands are terminated by the Gd(0001) face and that a (8×2) overlayer is formed.

  • Received 5 August 1997

DOI:https://doi.org/10.1103/PhysRevB.56.R10071

©1997 American Physical Society

Authors & Affiliations

R. G. White, M. H. Lee, and N. P. Tucker

  • Interdisciplinary Research Centre in Surface Science, University of Liverpool, Liverpool L69 3BX, United Kingdom

S. D. Barrett

  • Interdisciplinary Research Centre in Surface Science, and Department of Physics, University of Liverpool, Liverpool L69 3BX, United Kingdom

P. W. Murray

  • Interdisciplinary Research Centre in Surface Science, Department of Chemistry, University of Manchester, Manchester M13 9PL, United Kingdom

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Issue

Vol. 56, Iss. 16 — 15 October 1997

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