ExLibris header image
SFX Logo
Title: A 16 cm broad‐beam ion source for ion‐beam etching of quartz wafers
Source:

Review of Scientific Instruments [0034-6748] Rao, Yusheng yr:1996


Collapse list of basic services Basic
Full text
Full text available via AIP Digital Archive
GO
Full text available via AIP Journals (American Institute of Physics)
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.