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Title:
Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si–O–H) and thermal oxide (SiO2 or Si–O–N) underlayers
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Journal of Applied Physics [0021-8979] Green, M L yr:2002
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Author
Other articles by this author? -- in
GeoRef
author:
Green, M L
Busch, B
Wilk, G D
Sorsch, T
Conard, T
Brijs, B
Vandervorst, W
Räisänen, P I
Muller, D
Bude, M
Grazul, J
last name
initials
Other articles by this author? -- in
Online Contents Geosciences
author:
Green, M L
Busch, B
Wilk, G D
Sorsch, T
Conard, T
Brijs, B
Vandervorst, W
Räisänen, P I
Muller, D
Bude, M
Grazul, J
last name
initials
Other articles by this author? -- using
Web of Science
author:
Green, M L
Busch, B
Wilk, G D
Sorsch, T
Conard, T
Brijs, B
Vandervorst, W
Räisänen, P I
Muller, D
Bude, M
Grazul, J
last name
initials
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